The high-vacuum technology equipment of the Delta-IR10 series is designed for ion-plasma cleaning of optical surfaces and deposition of diamond-like carbon (DLC) and clarifying coatings using plasma-enhanced chemical vapor deposition (PECVD) method in the production of precision optical components.

Etching of the components is performed in a diode-capacitive reactor configuration with the ability to vary the energy and composition of atoms bombarding the surface. Processing can be carried out in a reducing, neutral, or oxidizing environment, removing or restoring an oxide layer on the substrate surface. To enhance etching uniformity during processing, the technological stage is rotated and cooled.

Uniform delivery of carbon-containing gas to the deposition zone, along with spatially distributed chamber evacuation, significantly improves coating deposition uniformity. Coating deposition control is carried out automatically by monitoring the reflection from a witness or flat part located at the center of the stage.