Chemical vapor deposition is a process in which material is deposited on a substrate by chemical reactions of gases

Plasma deposition is a process where material is deposited on a substrate using plasma, chemical treatment

Physical vapor deposition is a process in which material is deposited on a substrate by evaporation and condensation

Technology of cleaning surfaces from organic and inorganic contaminants using chemical reaction

Removal of contaminants using various cleaning methods: physical or chemical, liquid or dry

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