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IOTA Series

The Iota series vacuum process equipment is designed for thin film deposition with the ability to heat the processed substrates up to 800°C. Depending on the application, it can be equipped with various technology stations such as electron beam evaporation, thermal evaporation, magnetron sputtering, and ion beam sputtering. The chamber is equipped with a viewing window with a shutter for visual monitoring of the technological process.


The equipment features a load-lock system that ensures process stability and an oil-free pumping system. It can operate in automatic, semi-automatic, and manual modes. The technician can create technological recipes, store them in the equipment's memory, and edit them during automatic operation. The Iota series systems are suitable for laboratory research and small-scale production. 

Technologies and Parameters



Substrate Holder Geometry

Suspended with a diameter of 200 mm

Substrate Holder Rotation Speed

From 1 to 20 rpm

Substrate Geometry Any shape and size within a diameter of 200 mm
Substrate Material Semiconductor plates
Main Technologies

Preparation:   Ion beam cleaning   Heating


Layer Deposition (options):   Electron-beam evaporation    Thermal evaporation

                                                  Magnetron sputtering              Ion beam sputtering
Complementary technology

Substrate offset   Ion-plasma assist   Ion beam etching

Uniformity ± 2 %
Heating Temperature Up to 350 °C   Up to 800 °C (option)
Control Means Time control   Control via quartz sensor
Features Gate loading
High vacuum pump Turbomolecular pump
Forevacuum pump Dry scroll pump
Electrical Requirements 3-phase 380 V / 50 Hz
Power Consumption, not exceeding 18 kW
Dimensions of the equipment, not exceeding (LxWxH) 1650х1800х2270 mm
Weight, not exceeding 2000 kg


Are you interested in the equipment or still have questions? Contact us