IOTA Series
The Iota series vacuum process equipment is designed for thin film deposition with the ability to heat the processed substrates up to 800°C. Depending on the application, it can be equipped with various technology stations such as electron beam evaporation, thermal evaporation, magnetron sputtering, and ion beam sputtering. The chamber is equipped with a viewing window with a shutter for visual monitoring of the technological process.
The equipment features a load-lock system that ensures process stability and an oil-free pumping system. It can operate in automatic, semi-automatic, and manual modes. The technician can create technological recipes, store them in the equipment's memory, and edit them during automatic operation. The Iota series systems are suitable for laboratory research and small-scale production.
Technologies and Parameters
Series |
Iota |
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Substrate Holder Geometry |
Suspended with a diameter of 200 mm |
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Substrate Holder Rotation Speed |
From 1 to 20 rpm |
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Substrate Geometry | Any shape and size within a diameter of 200 mm | ||
Substrate Material | Semiconductor plates | ||
Main Technologies |
Preparation: • Ion beam cleaning • Heating
Layer Deposition (options): • Electron-beam evaporation • Thermal evaporation • Magnetron sputtering • Ion beam sputtering |
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Complementary technology |
• Substrate offset • Ion-plasma assist • Ion beam etching |
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Uniformity | ± 2 % | ||
Heating Temperature | • Up to 350 °C • Up to 800 °C (option) | ||
Control Means | • Time control • Control via quartz sensor | ||
Features | Gate loading | ||
High vacuum pump | Turbomolecular pump | ||
Forevacuum pump | Dry scroll pump | ||
Electrical Requirements | 3-phase 380 V / 50 Hz | ||
Power Consumption, not exceeding | 18 kW | ||
Dimensions of the equipment, not exceeding (LxWxH) | 1650х1800х2270 mm | ||
Weight, not exceeding | 2000 kg |