The Ultra series vacuum process equipment is designed for thin film deposition using magnetron sputtering with prior ion cleaning and the ability to heat the substrates up to 350°C.

The substrates can have different shapes and sizes and are vertically mounted in special frames, ensuring low defect levels. The processing zone varies from 2x200 to 800x1000 mm depending on the requirements. The equipment is equipped with up to 5 magnetrons, allowing for the formation of multilayer structures and multi-component coatings.

The stability of the technological process and coating characteristics is ensured by the use of load-lock systems. The equipment can operate continuously for extended periods, making it suitable for both mass production and small-scale manufacturing.